8-12 Inch Automatic Thinning Machine​

The ​8-12 Inch Automatic Thinning Machine​ is a cutting-edge solution designed for high-precision grinding, cutting, and material processing. Engineered for versatility and efficiency, this machine caters to diverse industrial needs, offering two configurations to handle workpieces ranging from ​4"-8" (0200 mm)​​ to ​8"-12" (0300 mm)​.

This machine integrates advanced automation with robust mechanical design, ensuring exceptional accuracy and productivity. Its dual-spindle configuration and customizable processing modes (wet/dry) make it ideal for applications such as metal grinding, precision cutting, and surface finishing. The inclusion of real-time water flow monitoring and vacuum chuck systems further enhances operational safety and consistency.

Technical Specifications

Parameter​	​Max @200 mm (4"-8")​​	​Max @300 mm (8"-12")​​
​Working Size​	Up to 200 mm (4"-8")	Up to 300 mm (8"-12")
​Spindle Configuration​	Dual Spindle	Dual Spindle
​Motor Power​	7.5 kW	8.3 kW
​Rotation Speed​	1000–6000 rpm	1000–4000 rpm
​Z-axis Min. Step Feed​	0.0001 mm	0.0001 mm
​Cutting Accuracy​	±0.002 mm	±0.002 mm
​Grinding Wheel​	Ø200 mm (Tsz25 mm, R≥2000 mm)	Ø300 mm (Tsz25 mm, R≥2000 mm)
​Workpiece Thickness​	0.1–1.2 mm	0.1–1.2 mm
​Vacuum Chuck​	-65 to -420 mmHg	-65 to -420 mmHg
​Chuck Rotation Speed​	0–200 rpm	0–200 rpm
​Machine Dimensions​	3140 x 1790 x 1820 mm	3140 x 1790 x 1820 mm
​Machine Weight​	5200 kg	~5200 kg

Key Features & Advantages of Thinning Machine​

​

1. ​Dual-Spindle Design​

   • Simultaneous processing of two workpieces enhances efficiency without compromising precision.

2. ​High-Precision Motor & Spindle​

   • Powerful 7.5 kW/8.3 kW motors drive spindles capable of speeds up to 6000 rpm, ensuring rapid material removal while maintaining ​​±0.002 mm cutting accuracy.

3. ​Ultra-Fine Z-axis Control​

   • ​0.0001 mm step feed​ enables micro-adjustments for intricate tasks like thin-workpiece grinding or surface polishing.

4. ​Versatile Processing Modes​

   • Supports ​wet (coolant-assisted)​​ and ​dry (high-pressure fan cooling)​​ operations to suit material types and reduce heat buildup.

5. ​Robust Vacuum Chuck System​

   • Stable workpiece clamping with adjustable suction pressure (​-65 to -420 mmHg) ensures alignment and safety during high-speed processing.

6. ​User-Friendly Interface​

   • A ​12.1-inch touchscreen​ integrated with an industrial PC simplifies parameter programming and real-time monitoring.

7. ​Low Maintenance​

   • ​Rinse + High-pressure Fan Cleaning​ system minimizes downtime by preventing debris buildup.

Application

Semiconductor Industry​

The 8-12 Inch Automatic Thinning Machine is engineered to meet the demanding requirements of semiconductor manufacturing, offering precision, scalability, and automation for next-generation wafer processing.

1. ​Material Versatility​

• Supports ​silicon, ​SiC (silicon carbide)​, ​GaN (gallium nitride)​, ​sapphire, and other compound semiconductor materials.
• Ideal for ​power devices​ (e.g., IGBTs, MOSFETs), ​photovoltaics, ​MEMS sensors, and ​optoelectronic components​ requiring ultra-thin wafer (<1.2 mm) processing.
  

​2. High-Precision Wafer Thinning​

• Achieves ​​±0.002 mm cutting accuracy​ and ​0.0001 mm micro-step feed​ for minimal material loss and stress-free thinning.
• Ensures uniform thickness across 8–12-inch wafers, critical for stacking and 3D integration in advanced packaging.
  ​

3. High-Throughput Automation​

• Dual-spindle design processes ​two wafers simultaneously, doubling output while maintaining consistency.
• Automated vacuum chuck system (-65 to -420 mmHg) secures wafers of varying thicknesses (0.1–1.2 mm) for contamination-free, high-speed grinding.
  ​

4. Full Automation for Scaling Production​

• Wet/dry dual-mode operation optimizes heat dissipation and debris management during high-volume wafer thinning.
• 12.1-inch touchscreen interface enables programmable workflows for repetitive tasks in ​MEMS, ​sensor fabrication, and ​photonic device manufacturing.
  

​5. Frontier Technology Support​

• Enables breakthroughs in ​GaN-on-Si​ and ​SiC power modules​ by achieving ultra-thin, high-quality epitaxial layers.
• Compatible with ​heterogeneous integration​ trends, such as fan-out wafer-level packaging (FOWLP) and chiplet architectures.

ZMSH Automatic Thinning Machine​

Frequently Asked Questions (FAQ)

​Q: What semiconductor materials does this machine support?​
A: It processes ​Silicon (Si)​, ​Silicon Carbide (SiC)​, ​Gallium Nitride (GaN)​, ​Sapphire, and other compound materials. Ideal for ​power devices​ (e.g., IGBTs, MOSFETs), ​photovoltaics, ​MEMS sensors, and ​optoelectronic components​ requiring ultra-thin wafer processing.

​Q: Can it handle ultra-thin wafers (<1.2 mm)?​

A: Yes! With ​​±0.002 mm cutting accuracy​ and a vacuum clamping system, it stabilizes wafers from ​0.1–1.2 mm​ thickness, preventing edge chipping or stress damage.

Q: How does it ensure high-precision machining?​

A: Equipped with ​0.0001 mm micro-step feed​ and intelligent algorithms that compensate for thermal deformation and mechanical errors, ensuring consistency in ​3D integration​ and ​heterogeneous packaging.

Related Products

Sapphire wafers

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8-12 Inch Automatic Thinning Machine High-precision Grinding Cutting Material Processing Images